KxS Technologies – DCM-10

Description

DCM-10

Inline Concentration Monitor for Critical Fab Wet Chemicals is Designed to:

DEFINE incoming clean chemicals (SC-1, SC-2, dHF) and raw CMP slurry density.
ACHIEVE AND ENSURE H2O2 concentration in CMP slurries for copper, tungsten and interlayer dielectric applications.
CORRELATE etch rate ER in e.g. wafer backside poly etch HF:HNO3 and buffered oxide etch BOE.
OPTIMIZE bath life of post-etch residue removers like EKC265™ and other solvents in wet strip tools.

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