KxS Technologies - DCM-10

KxS Technologies – DCM-10

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DCM-10

Inline Concentration Monitor for Critical Fab Wet Chemicals is Designed to:

  • DEFINE incoming clean chemicals (SC-1, SC-2, dHF) and raw CMP slurry density.
  • ACHIEVE AND ENSURE H2O2 concentration in CMP slurries for copper, tungsten and interlayer dielectric applications.
  • CORRELATE etch rate ER in e.g. wafer backside poly etch HF:HNO3 and buffered oxide etch BOE.
  • OPTIMIZE bath life of post-etch residue removers like EKC265™ and other solvents in wet strip tools.
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Key Features

  • True standalone operation: All measurement functions contained within the sensor, eliminating the need for an external transmitter.
  • Extra small footprint design: The compact sensor and flow are ideal and fit into fab tools and benches.
  • Excellent flow properties: True full bore; Optimized laminar flow pattern with minimal shear force on liquid (Patent pending).
  • Easy installation: Connects with process line sizes of ¼, ⅜, ½, ¾, and 1 inch, using standard fittings.
  • Dual-body construction: Optical components remain intact even if the flow cell is removed, ensuring consistent performance.
  • Material compatibility: Materials designed to withstand the demanding conditions of semiconductor processing in the facilities and cleanroom environments.

Additional information

Industry

Semiconductor and Data Centers
Segment

Instrumentation and Automation
Manufacturer

KxS Technologies

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KxS Technologies - DCM-10

KxS Technologies – DCM-10

KxS Technologies Logo

DCM-10

Inline Concentration Monitor for Critical Fab Wet Chemicals is Designed to:

  • DEFINE incoming clean chemicals (SC-1, SC-2, dHF) and raw CMP slurry density.
  • ACHIEVE AND ENSURE H2O2 concentration in CMP slurries for copper, tungsten and interlayer dielectric applications.
  • CORRELATE etch rate ER in e.g. wafer backside poly etch HF:HNO3 and buffered oxide etch BOE.
  • OPTIMIZE bath life of post-etch residue removers like EKC265™ and other solvents in wet strip tools.
REQUEST A QUOTE

PRODUCT DESCRIPTION:

Key Features

  • True standalone operation: All measurement functions contained within the sensor, eliminating the need for an external transmitter.
  • Extra small footprint design: The compact sensor and flow are ideal and fit into fab tools and benches.
  • Excellent flow properties: True full bore; Optimized laminar flow pattern with minimal shear force on liquid (Patent pending).
  • Easy installation: Connects with process line sizes of ¼, ⅜, ½, ¾, and 1 inch, using standard fittings.
  • Dual-body construction: Optical components remain intact even if the flow cell is removed, ensuring consistent performance.
  • Material compatibility: Materials designed to withstand the demanding conditions of semiconductor processing in the facilities and cleanroom environments.

RELATED PRODUCTS:

Related products