KxS Technologies – DCM-10

DCM-10

Inline Concentration Monitor for Critical Fab Wet Chemicals is Designed to:

DEFINE incoming clean chemicals (SC-1, SC-2, dHF) and raw CMP slurry density.
ACHIEVE AND ENSURE H2O2 concentration in CMP slurries for copper, tungsten and interlayer dielectric applications.
CORRELATE etch rate ER in e.g. wafer backside poly etch HF:HNO3 and buffered oxide etch BOE.
OPTIMIZE bath life of post-etch residue removers like EKC265™ and other solvents in wet strip tools.

True standalone operation: All measurement functions contained within the sensor, eliminating the need for an external transmitter.
Extra small footprint design: The compact sensor and flow are ideal and fit into fab tools and benches.
Excellent flow properties: True full bore; Optimized laminar flow pattern with minimal shear force on liquid (Patent pending).
Easy installation: Connects with process line sizes of ¼, ⅜, ½, ¾, and 1 inch, using standard fittings.
Dual-body construction: Optical components remain intact even if the flow cell is removed, ensuring consistent performance.
Material compatibility: Materials designed to withstand the demanding conditions of semiconductor processing in the facilities and cleanroom environments.

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