Analytik Jena – PlasmaQuant MS – ICP-MS Analyzer

Analytik Jena Logo

  • Sensitive – 1500 Mcps/ppm at <2 % CeO
  • Cost-Effective – half the argon consumption
  • Fast – 50 % higher sample throughput
  • Robust – matrix-independent long-term stability
  • Versatile – optimized for research and routine use

LEARN MORE:
https://www.analytik-jena.us/products/elemental-analysis/icp-ms/plasmaquant-ms/

REQUEST A QUOTE

PRODUCT DESCRIPTION:

Faster, more sensitive, less expensive ICP-MS analysis for modern laboratories

Both research and routine laboratories with the highest efficiency and detection standards benefit from the PlasmaQuant MS series of ICP-MS instruments in three ways: market-leading sensitivity, the highest sample throughput, and the lowest costs per sample. These three benefits combine to provide a complete package that equips laboratories with great competitive advantages.

Sensitivity and Efficiency

The unparalleled level of sensitivity of the PlasmaQuant MS provides you with analytical advantages that are clearly reflected in efficiency and lower costs per sample.

  • Best detection limits
  • High throughput
  • Reduced sample preparation
  • Robust performance
  • Low maintenance requirements

The patented spectrometer design of the ICP-MS systems provides for the lowest detection limits and consistent analytical quality for extremely short integration times and high dilution factors. This ensures high throughput, long-term stability, and reproducible results, while significantly reducing your maintenance costs.

The combination of high sensitivity, high scanning speeds, and short integration times is perfect for laser ablation and single particle analysis. In addition, the outstanding mass separation feature provides the best conditions for isotope analysis.

Configure your personal ICP-MS instrument

The PlasmaQuant MS series offers four models optimized for individual application requirements. Together with a range of upgrade options and accessories, the systems can be optimally adapted to the respective field of application.